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Proceedings Paper

High-performance and stability reticle writing system HL-800M
Author(s): Yasuhiro Kadowaki; Katsuhiro Kawasaki; Kazui Mizuno; Hidetoshi Satoh; Morihisa Hoga; Ken Uryu
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Paper Abstract

HL-800M has been developed as electron beam reticle writing system (EB) for advanced reticle production. It is very important for EB to keep high performance constantly in the actual advanced reticle production. To meet such a requirement, this system adopts accelerated voltage of 50kV, variable shaped beam, continuous moving stage and 3-stage deflector. Especially, to improve the positioning accuracy, this system has temperature control system, active vibration-isolation system and the new software for position error correction. The proximity effect correction which changes exposure shot time depending on the pattern density and the multi-exposure function are also installed. As a result, the positing accuracy of 32nm and the long term placement of 28 nm are obtained. The line-width linearity from 1 micrometers to 10 micrometers is within the range of 70 nm, and 40 nm form 1 micrometers to 3 micrometers . The stitching accuracy at the stripe boundary is 26nm, and 20nm in case of the 3-path exposure.

Paper Details

Date Published: 1 September 1998
PDF: 9 pages
Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); doi: 10.1117/12.328806
Show Author Affiliations
Yasuhiro Kadowaki, Hitachi, Ltd. (Japan)
Katsuhiro Kawasaki, Hitachi, Ltd. (Japan)
Kazui Mizuno, Hitachi, Ltd. (Japan)
Hidetoshi Satoh, Hitachi, Ltd. (Japan)
Morihisa Hoga, Hitachi, Ltd. (Japan)
Ken Uryu, Hitachi, Ltd. (Japan)

Published in SPIE Proceedings Vol. 3412:
Photomask and X-Ray Mask Technology V
Naoaki Aizaki, Editor(s)

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