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Proceedings Paper

New flatness measurement instrument for 230-mm lapped and polished photomasks
Author(s): Paul G. Dewa; Andrew W. Kulawiec; Stephen K. Mack; John J. Nemechek
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Paper Abstract

Tropel has developed a new instrument for the measurement of next generation photomasks. The instrument is capable of measuring the flatness of rough lapped, fine lapped and polished mask blanks with better than 0.1 micrometer accuracy. Well suited to production control and process development, the instrument utilizes a non-contact method to perform complete surface evaluation in less than 1 minute. The fundamental measurement technique is grazing-incidence interferometry. A novel optical design suppresses interference fringes from unwanted second surface reflections. This is a significant advantage over normal- incidence interferometers that typically require photomasks to be temporarily coated to address second surface interference effects. Coating and subsequent cleaning may damage polished photomasks as well as add unnecessary process steps.

Paper Details

Date Published: 1 September 1998
PDF: 7 pages
Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); doi: 10.1117/12.328803
Show Author Affiliations
Paul G. Dewa, Tropel Corp. (United States)
Andrew W. Kulawiec, Tropel Corp. (United States)
Stephen K. Mack, Tropel Corp. (United States)
John J. Nemechek, Tropel Corp. (United States)


Published in SPIE Proceedings Vol. 3412:
Photomask and X-Ray Mask Technology V
Naoaki Aizaki, Editor(s)

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