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Proceedings Paper

Thin films of LiNbO3 prepared on SiO2 /Si by sol-gel processing for active SOS device applications
Author(s): Shi De Cheng; Chan Hin Kam; Yan Zhou; Yee Loy Lam; Yuen Chuen Chan; X. Z. Wang; Zhuo Sun
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Paper Abstract

Thin films of lithium niobate are derived on SiO2/Si substrate by the sol-gel method. The solution is prepared by mixing LiOC2H5 and Nb(OC2H5)5. The films are deposited by spin coating and are annealed at different temperatures of 400 degree(s)C, 500 degree(s)C, 600 degree(s)C and 700 degree(s)C. The films are characterized by means of X-ray diffraction, atomic force microscopy and variable angle spectroscopic ellipsometry. The experimental results show that when the heat treatment temperature is about 500 degree(s)C, the films starts to crystallize and the desirable ferroelectric phase dominates. The crystalline size of the 500 degree(s)C annealed film ranges from 39 nm to 86 nm and the film is microscopically continuous and uniform. The refractive index of the film is found to be 1.83 at the wavelength of 633 nm. The nanocrystalline nature, the ferroelectric phase and the refractive index of the films make them potential candidates for active integrated optical component applications.

Paper Details

Date Published: 4 December 1998
PDF: 5 pages
Proc. SPIE 3491, 1998 International Conference on Applications of Photonic Technology III: Closing the Gap between Theory, Development, and Applications, (4 December 1998); doi: 10.1117/12.328774
Show Author Affiliations
Shi De Cheng, Nanyang Technological Univ. (Singapore)
Chan Hin Kam, Nanyang Technological Univ. (Singapore)
Yan Zhou, Nanyang Technological Univ. (Singapore)
Yee Loy Lam, Nanyang Technological Univ. (Singapore)
Yuen Chuen Chan, Nanyang Technological Univ. (Singapore)
X. Z. Wang, Nanyang Technological Univ. (Singapore)
Zhuo Sun, Nanyang Technological Univ. (Singapore)


Published in SPIE Proceedings Vol. 3491:
1998 International Conference on Applications of Photonic Technology III: Closing the Gap between Theory, Development, and Applications
George A. Lampropoulos; Roger A. Lessard, Editor(s)

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