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Proceedings Paper

Optical characterization of light-emitting porous silicon covered by transparent a-C:H coating
Author(s): Alexander Dorofeev; Franco Gaspari; Dammika Manage; Emmanuel Sagnes; Tome Kosteski; Stefan Zukotynski
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Paper Abstract

Porous silicon (PS) is a promising but rather unstable photonic material. Plasma deposition of a protective amorphous hydrogenated carbon (a-C:H) coating was used to improve the stability of porous silicon's compositional and optical properties. a-C:H films, 0.2 - 0.5 micrometers thickness, were deposited on porous silicon at room temperature from a methane plasma generated in a five-electrode saddle-field glow-discharge chamber. Plasma-deposited films exhibited good adhesion, nano-scale smoothness, and excellent mechanical integrity. Photoluminescence, UV/VIS reflectance, SEM, and FTIR adsorption spectra of a-C:H/PS structures were measured. The a-C:H films were over 80% transparent in the 0.5 - 5 micrometers range and enhanced the stability of the luminescence of the light-emitting PS.

Paper Details

Date Published: 4 December 1998
PDF: 6 pages
Proc. SPIE 3491, 1998 International Conference on Applications of Photonic Technology III: Closing the Gap between Theory, Development, and Applications, (4 December 1998); doi: 10.1117/12.328604
Show Author Affiliations
Alexander Dorofeev, Univ. of Toronto (Canada)
Franco Gaspari, Univ. of Toronto (Canada)
Dammika Manage, Univ. of Toronto (Canada)
Emmanuel Sagnes, Univ. of Toronto (Canada)
Tome Kosteski, Univ. of Toronto (Canada)
Stefan Zukotynski, Univ. of Toronto (Canada)


Published in SPIE Proceedings Vol. 3491:
1998 International Conference on Applications of Photonic Technology III: Closing the Gap between Theory, Development, and Applications
George A. Lampropoulos; Roger A. Lessard, Editor(s)

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