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Proceedings Paper

SCH dependence of linewidth enhancement factor for high-speed 1.55-um multiple quantum well laser diodes
Author(s): Beomhoan O; Heung-Ro Choo; Hyung Mun Kim; Soon-Ryong Park; Jeong Soo Kim
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Paper Abstract

The linewidth enhancement factor is the crucial design parameter with others, such as gain and refractive index changes for semiconductor laser diodes (LD). The changes of characteristics are measured according to the variation of the thickness of SCH (Separate Confinement Heterostructure, 1.24 micrometer p-InGaAsP). The gain spectra were obtained from the spontaneous emission for three LD's. The threshold current; Ith were about 15 mA. The optical field profiles for various SCH thickness was calculated from the effective index and transfer matrix method and the corresponding optical confinement factors are compared with the variation of measured (alpha) . It is meaningful to find the SCH thickness, SCH(Gamma max), of maximum confinement (Gamma) for given LD structure. Although the improvement of the linewidth enhancement factor ((alpha) ) in thicker SCH (greater than SCH(Gamma max)) has been known, it has not been measured for thin SCH (less than SCH(Gamma max)). Here, we compare the measured linewidth enhancement factors of three DFB-LD's with different SCH thickness of 500, 750, and 1000 angstrom, which are all smaller than the SCH(Gamma max) for given structure. It is shown that (alpha) would be improved as SCH thickness increases up to 1500 angstrom (approximately SCH(Gamma max)) for given structure if other design parameters permit.

Paper Details

Date Published: 29 October 1998
PDF: 8 pages
Proc. SPIE 3429, Current Developments in Optical Design and Engineering VII, (29 October 1998); doi: 10.1117/12.328537
Show Author Affiliations
Beomhoan O, Inha Univ. (South Korea)
Heung-Ro Choo, Electronics and Telecommunications Research Institute (South Korea)
Hyung Mun Kim, Electronics and Telecommunications Research Institute (South Korea)
Soon-Ryong Park, Inha Univ. (South Korea)
Jeong Soo Kim, Electronics and Telecommunications Research Institute (South Korea)


Published in SPIE Proceedings Vol. 3429:
Current Developments in Optical Design and Engineering VII
Alson E. Hatheway; Robert E. Fischer; Malachy McConnell; Lawrence M. Germann; Lawrence M. Germann; Alson E. Hatheway; Malachy McConnell; Warren J. Smith, Editor(s)

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