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Proceedings Paper

Testing of optical materials for 193-nm applications
Author(s): Vladimir Liberman; Mordechai Rothschild; Jan H. C. Sedlacek; Ray S. Uttaro; Andrew Grenville; Allen Keith Bates; Chris K. Van Peski
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Paper Abstract

We present an assessment of bulk fused silica and calcium fluoride, and of antireflective coatings for 193-nm lithographic applications. In the course of extensive marathon studies we have accumulated 1-5 billion laser pulses on over 100 bulk material samples at fluences from 0.2 to 4 mJ/cm2/pulse. The result show large variation in both initial and induced absorption of fused silica and in densification of fused silica. For antireflective coatings, there are samples that undergo no appreciable degradation when irradiated for > 1 billion pulses at 15 mJ/cm2/pulse. However, initial losses in some coatings may be unacceptably high for lithographic applications.

Paper Details

Date Published: 27 October 1998
PDF: 8 pages
Proc. SPIE 3427, Optical Systems Contamination and Degradation, (27 October 1998); doi: 10.1117/12.328512
Show Author Affiliations
Vladimir Liberman, MIT Lincoln Lab. (United States)
Mordechai Rothschild, MIT Lincoln Lab. (United States)
Jan H. C. Sedlacek, MIT Lincoln Lab. (United States)
Ray S. Uttaro, MIT Lincoln Lab. (United States)
Andrew Grenville, Intel Corp. (United States)
Allen Keith Bates, IBM and SEMATECH (United States)
Chris K. Van Peski, SEMATECH (United States)


Published in SPIE Proceedings Vol. 3427:
Optical Systems Contamination and Degradation
Philip T. C. Chen; William E. McClintock; Gary J. Rottman, Editor(s)

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