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Proceedings Paper

Comparison of contamination model predictions to LDEF surface measurements
Author(s): Raymond Rantanen; Tim Gordon; Miria M. Finckenor; Harold Gary Pippin
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Paper Abstract

Contaminant deposition measurement have been made on species content and depth profiles on three experiment trays from the long duration exposure facility (LDEF), Auger, Argon sputtering, ESCA and SEM analysis was used to define the contaminant deposits. The Integrated Spacecraft Environments Model (ISEM) was used to predict the deposition levels of the contaminants measured on the three trays. The details of the modeling and the assumptions use dare presented along with the predictions for the deposition on select surfaces on the trays. These are compared to the measured results. The trays represents surfaces that have a high atomic oxygen flux, an intermediate oxygen flux, and no oxygen flux. All surfaces received significant solar UV flux. It appears that the atomic oxygen is necessary for significant deposition to occur. Surfaces that saw significant contaminant flux, solar UV and no atomic oxygen did not show any appreciable levels of observable deposition. The implications of the atomic oxygen interaction with contaminant deposits from silicon contaminant sources is discussed. The primary contaminant sources in the LDEF analysis are DC6-1104 adhesive and Z-306 paint. The result and interpretation of the findings have a potential significant impact on spacecraft surfaces that are exposed to solar UV and atomic oxygen in low Earth orbit.

Paper Details

Date Published: 27 October 1998
PDF: 12 pages
Proc. SPIE 3427, Optical Systems Contamination and Degradation, (27 October 1998); doi: 10.1117/12.328498
Show Author Affiliations
Raymond Rantanen, ROR Enterprises, Inc. (United States)
Tim Gordon, Applied Science Technologies (United States)
Miria M. Finckenor, NASA Marshall Space Flight Ctr. (United States)
Harold Gary Pippin, Boeing Information, Space & Defence Systems (United States)

Published in SPIE Proceedings Vol. 3427:
Optical Systems Contamination and Degradation
Philip T. C. Chen; William E. McClintock; Gary J. Rottman, Editor(s)

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