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Proceedings Paper

Roughness evaluation from ultrapure fluid transfer surface materials for microelectronics fabrication
Author(s): Dumitru Gh. Ulieru
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Paper Abstract

The microelectronics fab need the manufacturing in ultraclean environments. The actual and future requirements of new generation of semiconductor devices become more stringent that which demand the reduction of tolerances to particles in cleanroom air and in processing liquids, gases and vacuum. The purity of process chemicals, water and gases is one area under scruting the systems for distribution. These fluids must also be examined so that their contamination charge to be minimal. For examining functional surfaces of fluid distribution systems by using more surface analysis tools such as electron spectroscopy for chemical analysis (ESCA), auger electron spectroscopy for chemical analysis (AES), scanning electron spectroscopy (SEM), brush analyzer or 3D laser scanner provide specification of a material identity, a measure of its surface contaminant, and a measurement record of surface roughness. In our paper we will analyze two case studies of investigation results of surface roughness measurement for electropolished 316L stainless steel and molded polyvinylidene fluoride (PVDF).

Paper Details

Date Published: 30 October 1998
PDF: 11 pages
Proc. SPIE 3426, Scattering and Surface Roughness II, (30 October 1998); doi: 10.1117/12.328460
Show Author Affiliations
Dumitru Gh. Ulieru, Romes SA (Romania)

Published in SPIE Proceedings Vol. 3426:
Scattering and Surface Roughness II
Zu-Han Gu; Alexei A. Maradudin, Editor(s)

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