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Proceedings Paper

Application of optical scatterometry to microelectronics and flat panel display processing
Author(s): John Robert McNeil; Stephen A. Coulombe; Petre-Catalin Logofatu; Christopher J. Raymond; S. Sohail H. Naqvi; George J. Collins
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Paper Abstract

Scatterometry, the analysis of light diffraction from periodic structures, is shown to be a versatile metrology technique applicable to a number of processes involved in the production of microelectronic devices, flat panel displays, and other technologies which involve precise dimensional control of micron and sub-micron features. This paper reviews metrology issues and requirements of these technologies and gives details on one application of scatterometry for illustration. Scatterometer results are compared to measurements of the same samples using other metrology techniques, including cross- section SEM, top-down SEM, AFM, and ellipsometry.

Paper Details

Date Published: 30 October 1998
PDF: 11 pages
Proc. SPIE 3426, Scattering and Surface Roughness II, (30 October 1998); doi: 10.1117/12.328456
Show Author Affiliations
John Robert McNeil, Univ. of New Mexico (United States)
Stephen A. Coulombe, Univ. of New Mexico (United States)
Petre-Catalin Logofatu, Univ. of New Mexico (United States)
Christopher J. Raymond, Univ. of New Mexico (United States)
S. Sohail H. Naqvi, Univ. of New Mexico (United States)
George J. Collins, Colorado State Univ. (United States)


Published in SPIE Proceedings Vol. 3426:
Scattering and Surface Roughness II
Zu-Han Gu; Alexei A. Maradudin, Editor(s)

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