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Proceedings Paper

Polarization of out-of-plane optical scatter from SiO2 films grown on photolithographically generated microrough silicon
Author(s): Thomas A. Germer; Bradley W. Scheer
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Paper Abstract

Bidirectional ellipsometry results are presented for scatter from SiO2 films grown on photolithographically produced microrough silicon surfaces. The principle direction of the polarization and the degree of linear polarization for scatter directions out of the plane of incidence are compared to results of theoretical modeling for interfacial microroughness in the presence of dielectric layers. The results indicate that light scattered from these surfaces does not behave like that from two truly random rough correlated interfaces. Possible reasons for the lack of agreement between the model and the data are discussed.

Paper Details

Date Published: 30 October 1998
PDF: 9 pages
Proc. SPIE 3426, Scattering and Surface Roughness II, (30 October 1998); doi: 10.1117/12.328451
Show Author Affiliations
Thomas A. Germer, National Institute of Standards and Technology (United States)
Bradley W. Scheer, VLSI Standards, Inc. (United States)

Published in SPIE Proceedings Vol. 3426:
Scattering and Surface Roughness II
Zu-Han Gu; Alexei A. Maradudin, Editor(s)

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