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Proceedings Paper

Laser-driven plasma CVD of thin films
Author(s): Vitali I. Konov; Alexander M. Prokhorov; S. A. Uglov; A. P. Bolshakov; I. A. Leontiev; Friedrich Dausinger; Helmut Huegel; Birgit Angstenberger; Gerd Sepold; Simeon Metev
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Paper Abstract

A novel technique for CVD synthesis of materials, that does not demand a vacuum chamber and provides high deposition rates, have been developed. It is based on CW CO2-laser maintenance of a stationary optical discharge in a gas stream, exhausting over a substrate into the air. Nano- and polycrystalline diamond films were deposited on tungsten substrates from atmospherics pressure Xe(Ar):H2:CH4 gas mixtures at flow rates 2 1/min. 2,5 kW CO2-laser focused beam produced plasma. Deposition area was about 1 cm2 and growth rates up to 30-50 micrometers /hour. Peculiarities and advantages of laser plasmatrons are discussed.

Paper Details

Date Published: 20 October 1998
PDF: 7 pages
Proc. SPIE 3484, Lasers in Synthesis, Characterization, and Processing of Diamond, (20 October 1998); doi: 10.1117/12.328191
Show Author Affiliations
Vitali I. Konov, General Physics Institute (Russia)
Alexander M. Prokhorov, General Physics Institute (Russia)
S. A. Uglov, General Physics Institute (Russia)
A. P. Bolshakov, General Physics Institute (Russia)
I. A. Leontiev, General Physics Institute (Russia)
Friedrich Dausinger, Stuttgart Univ. (Germany)
Helmut Huegel, Stuttgart Univ. (Germany)
Birgit Angstenberger, Stuttgart Univ. (Germany)
Gerd Sepold, Bremen Institute of Applied Beam Technology (Germany)
Simeon Metev, Bremen Institute of Applied Beam Technology (Germany)


Published in SPIE Proceedings Vol. 3484:
Lasers in Synthesis, Characterization, and Processing of Diamond
Vitali I. Konov; Victor G. Ralchenko, Editor(s)

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