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Proceedings Paper

Tunable 1.3- to 5-um wavelength target reflectance measurement system
Author(s): Mohan Vaidyanathan; William F. Lynn; Wendy C. Shemano; Carl W. Schmidt; Paul F. McManamon
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Paper Abstract

We describe a tunable, 1.3 to 5 micrometers wavelength reflectance measurement system using an optical parametric oscillator (OPO) as the light source. The OPO source consists of a 1 micrometers Nd:YAG laser which is frequently shifted to 1.3-5 micrometers wavelengths using a periodically poled lithium niobate nonlinear optical crystal. The system design, calibration, and measurement of the directional-hemispherical reflectance factor and the bi-directional reflectance distribution function of different target materials are presented.

Paper Details

Date Published: 16 October 1998
PDF: 10 pages
Proc. SPIE 3438, Imaging Spectrometry IV, (16 October 1998); doi: 10.1117/12.328108
Show Author Affiliations
Mohan Vaidyanathan, Northrop Grumman Corp. (United States)
William F. Lynn, Veda, Inc. (United States)
Wendy C. Shemano, Veda, Inc. (United States)
Carl W. Schmidt, Veda, Inc. (United States)
Paul F. McManamon, Air Force Research Lab. (United States)

Published in SPIE Proceedings Vol. 3438:
Imaging Spectrometry IV
Michael R. Descour; Sylvia S. Shen, Editor(s)

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