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Proceedings Paper

MMVF mastering for exposure processes and simulation
Author(s): Masaru Mukaida; Yuji Chaki; Shinichi Katsuda
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Paper Abstract

For realizing 5.2 GB/side recording capacity Multimedia video file (MMVF), we have been developing mastering technologies, which is requested to fabricate the fine preformat patterns (L/G pitch 0.578 micrometer, minimum pit length 0.39 micrometer), optimizing exposure processes through the verification by simulation technique. With an optimized, i.e. elliptical exposure beam profile, 2T pits of minimum pit length for ideal resolution by simulation can be fabricated. Optimizing the exposure beam shift makes it possible to easily fabricate a header whose shift difference from ideal shift (0.289 micrometer) is much smaller than the plus or minus 0.05 micrometer difference that begins to decrease prepit amplitude.

Paper Details

Date Published: 23 October 1998
PDF: 7 pages
Proc. SPIE 3401, Optical Data Storage '98, (23 October 1998); doi: 10.1117/12.327943
Show Author Affiliations
Masaru Mukaida, NEC Corp. (Japan)
Yuji Chaki, NEC Corp. (Japan)
Shinichi Katsuda, NEC Corp. (Japan)

Published in SPIE Proceedings Vol. 3401:
Optical Data Storage '98
Shigeo R. Kubota; Tomas D. Milster; Paul J. Wehrenberg, Editor(s)

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