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Proceedings Paper

Collimation method using an image processing technique for an assembling-type antenna
Author(s): Toshiyuki Okuyama; Shinichi Kimura; Yutaro Fukase; Hiroshi Ueno; Kouichi Harima; Hitoshi Sato; Tetsuji Yoshida
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Paper Abstract

To construct highly precise space structures, such as antennas, it is essential to be able to collimate them with high precision by remote operation. Surveying techniques which are commonly used for collimating ground-based antennas cannot be applied to space systems, since they require relatively sensitive and complex instruments. In this paper, we propose a collimation method that is applied to mark-patterns mounted on an antenna dish for detecting very slight displacements. By calculating a cross- correlation function between the target and reference mark- patterns, and by interpolating this calculated function, we can measure the displacement of the target mark-pattern in sub-pixel precision. We developed a test-bed for the measuring system and evaluated several mark-patterns suitable for our image processing technique. A mark-pattern with which enabled to detect displacement within an RMS error of 1/100 pixels was found. Several tests conducted using this chosen pattern verified the robustness of the method to different light conditions and alignment errors. This collimating method is designed for application to an assembling-type antenna which is being developed by the Communications Research Laboratory.

Paper Details

Date Published: 6 October 1998
PDF: 8 pages
Proc. SPIE 3521, Machine Vision Systems for Inspection and Metrology VII, (6 October 1998); doi: 10.1117/12.326952
Show Author Affiliations
Toshiyuki Okuyama, Communications Research Lab. (Japan)
Shinichi Kimura, Communications Research Lab. (Japan)
Yutaro Fukase, Shimizu Corp. (Japan)
Hiroshi Ueno, Shimizu Corp. (Japan)
Kouichi Harima, Shimizu Corp. (Japan)
Hitoshi Sato, Shimizu Corp. (Japan)
Tetsuji Yoshida, Shimizu Corp. (Japan)


Published in SPIE Proceedings Vol. 3521:
Machine Vision Systems for Inspection and Metrology VII
Bruce G. Batchelor; John W. V. Miller; Susan Snell Solomon, Editor(s)

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