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Proceedings Paper

Compact FTIR wafer-state sensors: a new way of in-line ULSI characterization
Author(s): Victor A. Yakovlev; Sylvie Bosch-Charpenay; Matthew Richter; Peter A. Rosenthal; Peter R. Solomon; Jiazhan Xu
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Paper Abstract

The perception of FTIR spectroscopy as an expensive, non- compact and vibration sensitive analytical technique, is rapidly changing with the recent introduction of small, robust and fast FTIR spectrometers dedicated to in-line and in-situ process control. FTIR Reflectance Spectroscopy has become a powerful in-line characterization technique delivering information on epi-thickness, doping concentration, dielectric film composition, molecular bond density, thickness of thick semiconductor films, deep trenches, etc., inaccessible in the visible range. The metrology capabilities of the technique will be outlined, including a discussion of process integration and semiconductor yield enchantment issues. The new instrument employs a vibrationally isolated FTIR interferometer and a high-speed digitizer. This combination allows a significantly faster scan rate, and a subsequently superior signal-to-noise ratio. The sensor is designed to be mounted on a process chamber equipped with normal or oblique ports, and provides normal or oblique incidence measuring modes. Outstanding vibration suppression, thermal stability, and high S/N makes it possible to achieve process control with monolayer thickness resolution. Particular examples on ULSI thin film/wafer-state FTIR metrology is presented.

Paper Details

Date Published: 27 August 1998
PDF: 10 pages
Proc. SPIE 3509, In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing II, (27 August 1998); doi: 10.1117/12.324422
Show Author Affiliations
Victor A. Yakovlev, On-Line Technologies Inc. (United States)
Sylvie Bosch-Charpenay, On-Line Technologies Inc. (United States)
Matthew Richter, On-Line Technologies, Inc. (United States)
Peter A. Rosenthal, On-Line Technologies Inc. (United States)
Peter R. Solomon, On-Line Technologies Inc. (United States)
Jiazhan Xu, On-Line Technologies Inc. (United States)


Published in SPIE Proceedings Vol. 3509:
In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing II
Sergio A. Ajuria; Tim Z. Hossain, Editor(s)

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