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Proceedings Paper

Enhanced defect detection capability using combined brightfield/darkfield imaging
Author(s): Mark M. Altamirano; Andrew Skumanich
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Paper Abstract

Engineering analysis and in-line monitoring common employ either a brightfield TDI imaging or a laser-based darkfield optical approach to defect detection on patterned wafers. Brightfield imaging techniques are commonly used for engineering analysis because of their sensitivity and ability to capture pattern defects, especially in high contrast areas. Laser-based darkfield detection is used because of capture capability on rough deposited layers requiring a good signal to noise ratio. The WF-73X is a laser-based detection system that utilizes a combination of brightfield and darkfield optical configurations. The system offers 0.1 micrometers sensitivity for engineering analysis and 30+ wafer per hour throughput for line monitoring. It combines two propriety technologies employing a five PMT detector configuration.

Paper Details

Date Published: 27 August 1998
PDF: 5 pages
Proc. SPIE 3509, In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing II, (27 August 1998); doi: 10.1117/12.324420
Show Author Affiliations
Mark M. Altamirano, Applied Materials (United States)
Andrew Skumanich, Applied Materials (United States)


Published in SPIE Proceedings Vol. 3509:
In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing II
Sergio A. Ajuria; Tim Z. Hossain, Editor(s)

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