Share Email Print
cover

Proceedings Paper

Noncontact COS charge analysis for in-line monitoring of wet cleaning processes
Author(s): Xiafang Zhang; Min Juang; Sung-Shan Tai; Kuo-in Chen; Ejigu Wossen; Gregory Horner
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Contamination levels in chemical cleaning equipment and wafer cleanliness in general are very critical to semiconductor manufacturers. In this work, a Keithley Instruments non contact electrical tester (Quantox) is used to measure the mobile ion (Qm) contamination in a variety of cleaning processes. Results show that photoresist strip cleaning process has a higher mobile ion concentration than standard pre-diffusion cleaning process. RCA1, RCA2 and HF solutions mapping measured by the Quantox indicates some negative static charges on the surface after cleaning. This negative field appears to assist Qm removal during wet chemical cleaning. The dependence of flatband voltage and other oxide charges on various cleaning processes has also been investigated using the Quantox. The data suggests that a dipole layer has been formed by a surface reaction during chemical cleaning.

Paper Details

Date Published: 27 August 1998
PDF: 9 pages
Proc. SPIE 3509, In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing II, (27 August 1998); doi: 10.1117/12.324398
Show Author Affiliations
Xiafang Zhang, Vishay Siliconix (United States)
Min Juang, Vishay Siliconix (United States)
Sung-Shan Tai, Vishay Siliconix (United States)
Kuo-in Chen, Vishay Siliconix (United States)
Ejigu Wossen, Vishay Siliconix (United States)
Gregory Horner, Keithley Instruments, Inc. (United States)


Published in SPIE Proceedings Vol. 3509:
In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing II
Sergio A. Ajuria; Tim Z. Hossain, Editor(s)

© SPIE. Terms of Use
Back to Top