Share Email Print
cover

Proceedings Paper

Chemical rate model for the surface pyrolysis of tetrakis(dimethylamido)titanium to form titanium nitride films
Author(s): Anthony J. Toprac; John A. Iacoponi; Karl A. Littau
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

A chemical kinetic rate model for the deposition of titanium nitride films from the surface reaction of tetrakis(dimethyl-amido)titanium (TDMAT) was developed. Without ammonia addition, TDMAT forms a titanium nitride film by pyrolyzing on the hot substrate surface. Experimental data from the applied materials 5000 deposition tool was modeled using a CSTR formulation. With the parameters of the surface reaction model regressed to fit portions of the experimental results, reasonably accurate model predictions over the entire domain of experimental data were obtained.

Paper Details

Date Published: 3 September 1998
PDF: 7 pages
Proc. SPIE 3507, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing IV, (3 September 1998); doi: 10.1117/12.324367
Show Author Affiliations
Anthony J. Toprac, Advanced Micro Devices, Inc. (United States)
John A. Iacoponi, Advanced Micro Devices, Inc. (United States)
Karl A. Littau, Applied Materials, Inc. (United States)


Published in SPIE Proceedings Vol. 3507:
Process, Equipment, and Materials Control in Integrated Circuit Manufacturing IV
Anthony J. Toprac; Kim Dang, Editor(s)

© SPIE. Terms of Use
Back to Top