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Proceedings Paper

SOPRA SE3000: a new tool for high-accuracy characterization of multilayer structures on very small spot size
Author(s): Pierre Boher; Marc Bucchia; Jean Pierre Rey; Jean-Louis P. Stehle
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Paper Abstract

In order to characterize 300mm wafers at different stages of the IC manufacturing, a new tool based on spectroscopic ellipsometry has been recently developed at SOPRA. This new instrument called SE-300 has some important new features compared to the other ellipsometers of SOPRA or of the competition. First the optical setup allows to obtain very small measurement spots down to 35 X 45 micrometers in polychromatic light to be able to work form deep UV 190nm to near IR; second the combined monochromator/spectrometer is directly setup on the analyzer arm and allows both multichannel and scanning measurements on the same spot. Scanning measurement made with a real double monochromator including prism and grating allows very accurate measurement that can be used to extract optical indices and solve complex multilayer structures. Multichannel measurements are made through a prism/grating spectrometer with quasi-linear dispersion in wavelength. All the elements are fully compatible with the new generation of 300mm wafers. Practical results obtained in a real environment are presented.

Paper Details

Date Published: 3 September 1998
PDF: 7 pages
Proc. SPIE 3507, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing IV, (3 September 1998); doi: 10.1117/12.324358
Show Author Affiliations
Pierre Boher, SOPRA SA (France)
Marc Bucchia, SOPRA SA (France)
Jean Pierre Rey, SOPRA SA (France)
Jean-Louis P. Stehle, SOPRA SA (France)

Published in SPIE Proceedings Vol. 3507:
Process, Equipment, and Materials Control in Integrated Circuit Manufacturing IV
Anthony J. Toprac; Kim Dang, Editor(s)

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