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Proceedings Paper

Silicon microlenses for IR image sensors
Author(s): Nuggehalli M. Ravindra; Fei Ming Tong; Dhiren K. Pattnaik; Dentcho I. Ivanov; Roland A. Levy; K. Aryusook; Vipulkumar Patel
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Paper Abstract

We report a comprehensive approach to design, fabricate and characterize silicon microlenses for applications in IR image sensors. ZEMAX design tool was used to assist in the design of the lenses. Conventional photolithography and thermal reflow of melting resist technique were deployed to achieve spherical resist patterns. Reactive ion etching (RIE) was utilized for transfer of resist patterns to the substrate in O2 and C2F6 environment. The shape of the fabricated lenses, i.e. radii of curvature and focal length were controlled within a wide range, by controlling the etch rates of resist and substrate, which were further controlled by varying the flow of gases, selectivity and power. Optical methods such as ray analysis and profilometry were used to obtain lens properties. Scanning electron microscopy was performed to analyze the morphology of the fabricated lenses.

Paper Details

Date Published: 31 August 1998
PDF: 10 pages
Proc. SPIE 3511, Micromachining and Microfabrication Process Technology IV, (31 August 1998); doi: 10.1117/12.324293
Show Author Affiliations
Nuggehalli M. Ravindra, New Jersey Institute of Technology (United States)
Fei Ming Tong, New Jersey Institute of Technology (United States)
Dhiren K. Pattnaik, New Jersey Institute of Technology (United States)
Dentcho I. Ivanov, New Jersey Institute of Technology (United States)
Roland A. Levy, New Jersey Institute of Technology (United States)
K. Aryusook, New Jersey Institute of Technology (United States)
Vipulkumar Patel, Sarnoff Corp. (United States)


Published in SPIE Proceedings Vol. 3511:
Micromachining and Microfabrication Process Technology IV
James H. Smith, Editor(s)

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