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Proceedings Paper

PMMA development studies using various synchrotron sources and exposure conditions
Author(s): Ming X. Tan; Michelle A. Bankert; Stewart K. Griffiths; Aili Ting; Dale R. Boehme; Shondelle Wilson; Lianna M. Balser
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Paper Abstract

PMMA has been the primary resist used in synchrotron exposures for micro-machined parts fabricated by the LIGA process. Because development of this resist directly influences both tolerances and surface finish of completed LIGA structures, it is important to have a good quantitative understanding of PMMA development as a function of the absorbed dose, as well as both the exposure and development conditions. The various synchrotron sources used for LIGA fabrication vary widely in beam energy and flux, and these variations would be expected to influence development rates. Here we present a simple method to measure PMMA development rate over a moderate range of doses using only a single exposure at the synchrotron source. By employing several exposures, this method allows ready determination of development rates over a wide range of exposure and development conditions. Results are presented for the kinetics of PMMA development over a range of development temperatures, absorbed doses, dose rates and sample ages for exposures performed at three major x-ray sources in the United States.

Paper Details

Date Published: 1 September 1998
PDF: 9 pages
Proc. SPIE 3512, Materials and Device Characterization in Micromachining, (1 September 1998); doi: 10.1117/12.324068
Show Author Affiliations
Ming X. Tan, Sandia National Labs. (United States)
Michelle A. Bankert, Sandia National Labs. (United States)
Stewart K. Griffiths, Sandia National Labs. (United States)
Aili Ting, Sandia National Labs. (United States)
Dale R. Boehme, Sandia National Labs. (United States)
Shondelle Wilson, Sandia National Labs. (United States)
Lianna M. Balser, Sandia National Labs. (United States)

Published in SPIE Proceedings Vol. 3512:
Materials and Device Characterization in Micromachining
Craig R. Friedrich; Yuli Vladimirsky, Editor(s)

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