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Proceedings Paper

Mathematical model for optimization of laser photoablated microstructures
Author(s): Raja Nassar; Ashok Krishnan
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Paper Abstract

Pulsed laser photoablation of polymers is a rapid prototyping technique that has applications for the manufacturing of high aspect ratio microparts. To enhance the manufacturing capability of the process, it is necessary to develop mathematical models to predict the scanning pattern of the pulsed laser on the material surface in order to etch a microstructure with a pre-specified geometry. In this study, we consider a model that predicts the number of pulses at each pixel of the surface to be scanned in order to produce a microstructure of a given geometry. In predicting the number of pulses at a pixel, the model takes into account the etch depth per pulse, the laser intensity distribution, and the geometry of the microstructure.

Paper Details

Date Published: 1 September 1998
PDF: 8 pages
Proc. SPIE 3512, Materials and Device Characterization in Micromachining, (1 September 1998); doi: 10.1117/12.324055
Show Author Affiliations
Raja Nassar, Louisiana Tech. Univ. (United States)
Ashok Krishnan, Louisiana Tech. Univ. (United States)

Published in SPIE Proceedings Vol. 3512:
Materials and Device Characterization in Micromachining
Craig R. Friedrich; Yuli Vladimirsky, Editor(s)

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