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Proceedings Paper

Properties of polycrystalline diamond as x-ray mask
Author(s): Jeng Tzong Sheu; G. Y. Yang; B. R. Huang
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Paper Abstract

1.5 micrometer thick polycrystalline diamond film was deposited using microwave plasma chemical vapor deposition (MPCVD) as x-ray mask membrane with 0.1 approximately 0.25 micrometer seeding. The temperature is controlled between 820 to 830 degree Celsius and the ratios of CH4/H2 gas mixtures are varied for the quality and stress of the diamond film. The optical properties and radiation damage of the membrane will be demonstrated. Low tensile stress diamond membrane has been formed with backside KOH etching. Surface morphology was monitored by the AFM and the quality of the diamond film was measured by the Raman spectroscopy.

Paper Details

Date Published: 1 September 1998
PDF: 8 pages
Proc. SPIE 3512, Materials and Device Characterization in Micromachining, (1 September 1998); doi: 10.1117/12.324054
Show Author Affiliations
Jeng Tzong Sheu, Synchrotron Radiation Research Ctr. (Taiwan)
G. Y. Yang, National Yunlin Technology Univ. (Taiwan)
B. R. Huang, National Yunlin Technology Univ. (Taiwan)

Published in SPIE Proceedings Vol. 3512:
Materials and Device Characterization in Micromachining
Craig R. Friedrich; Yuli Vladimirsky, Editor(s)

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