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Proceedings Paper

CMOS resonant sensors
Author(s): Oliver Brand; Mark Hornung; Dirk Lange; Henry Baltes
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Paper Abstract

This paper focuses on CMOS resonant sensors, i.e., resonant sensors fabricated with CMOS technology in combination with compatible micromachining steps. After reviewing resonant sensor principles, micromachining techniques applicable to CMOS resonant sensors are discussed. Subsequently, different excitation and detection mechanisms for silicon-based resonant sensors are compared. Finally, three examples of CMOS resonant microsensors, namely, an ultrasound proximity sensor, a chemical sensor and a vacuum sensor are discussed.

Paper Details

Date Published: 8 September 1998
PDF: 13 pages
Proc. SPIE 3514, Micromachined Devices and Components IV, (8 September 1998); doi: 10.1117/12.323895
Show Author Affiliations
Oliver Brand, Swiss Federal Institute of Technology (Switzerland)
Mark Hornung, Swiss Federal Institute of Technology (Switzerland)
Dirk Lange, Swiss Federal Institute of Technology (Switzerland)
Henry Baltes, Swiss Federal Institute of Technology (Switzerland)


Published in SPIE Proceedings Vol. 3514:
Micromachined Devices and Components IV
Patrick J. French; Kevin H. Chau, Editor(s)

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