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Proceedings Paper

Improved method for measuring low-level linear birefringence in optical materials
Author(s): Baoliang Bob Wang
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Paper Abstract

The authors reports in this paper a sensitive method for measuring low-level linear birefringence in optical materials. A photoelastic modulator is employed as the polarization modulation device in the set-up. The sensitivity of this method is evaluated to be at approximately 0.003 nm (approximately 0.002 degree(s) at 632.8 nm) by measuring the mechanically induced linear birefringence in a fused silica optical element. The capability of this method is demonstrated by determining the residual linear birefringence below 0.1 nm in several high quality optical elements.

Paper Details

Date Published: 23 September 1998
PDF: 5 pages
Proc. SPIE 3424, Inorganic Optical Materials, (23 September 1998); doi: 10.1117/12.323758
Show Author Affiliations
Baoliang Bob Wang, Hinds Instruments, Inc. (United States)

Published in SPIE Proceedings Vol. 3424:
Inorganic Optical Materials
Alexander J. Marker, Editor(s)

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