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Proceedings Paper

New holographic recording materials based on dual-cure photopolymer systems
Author(s): Daniel-Joseph Lougnot; Colette Turck; C. Leroy-Garel
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Paper Abstract

The limitation of the holographic sensitivity of photopolymer materials mostly result from an imbalance between photocrosslinking copolymerization and mass transfer processes. The development of new blends containing acrylate and vinyl ether monomers which undergo hybrid-cure polymerization, makes it possible to evade some of the typical shortcomings of multiacrylate formulations resulting thereof. Self-processing materials exhibiting an holographic sensitivity of up to 200 cm2/J and an energetic sensitivity below 20 mJ/cm2 are reported. The improvement of the reciprocity between exposure and holographic intensity opens up attractive prospects for applications requiring holographic exposure shorter than 0.5 second.

Paper Details

Date Published: 25 September 1998
PDF: 7 pages
Proc. SPIE 3417, Photopolymer Device Physics, Chemistry, and Applications IV, (25 September 1998); doi: 10.1117/12.323491
Show Author Affiliations
Daniel-Joseph Lougnot, Ecole Nationale Superieure de Chimie de Mulhouse (France)
Colette Turck, Ecole Nationale Superieure de Chimie de Mulhouse (France)
C. Leroy-Garel, Ecole Nationale Superieure de Chimie de Mulhouse (France)


Published in SPIE Proceedings Vol. 3417:
Photopolymer Device Physics, Chemistry, and Applications IV
Roger A. Lessard, Editor(s)

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