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Proceedings Paper

Fabrication of blazed gratings and grisms utilizing anisotropic etching of silicon
Author(s): Tatsuo Harada; Hideo Sakuma; Masaru Fuse
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Paper Abstract

The fabrication process of blazed diffraction gratings and grisms utilizing anisotropic etching of single crystal silicon is described. Grating patterns are formed either holographically or mechanically on the resist film coated onto the dioxide surface of the silicon substrate. Triangularly shaped grating grooves are formed by etching the substrate using KOH based solvent. The grooves are with the specific orientation of the single crystal so that accurate and ultra-smooth groove facets can be obtained especially for infrared gratings and shallow groove grisms.

Paper Details

Date Published: 24 September 1998
PDF: 6 pages
Proc. SPIE 3450, Theory and Practice of Surface-Relief Diffraction Gratings: Synchrotron and Other Applications, (24 September 1998); doi: 10.1117/12.323415
Show Author Affiliations
Tatsuo Harada, Tokyo Metropolitan Univ. (Japan)
Hideo Sakuma, Tokyo Metropolitan Univ. (Japan)
Masaru Fuse, Tokyo Metropolitan Univ. (Japan)


Published in SPIE Proceedings Vol. 3450:
Theory and Practice of Surface-Relief Diffraction Gratings: Synchrotron and Other Applications
Wayne R. McKinney; Christopher A. Palmer, Editor(s)

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