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Proceedings Paper

Selective hydrophobic and hydrophilic texturing of surfaces using photolithographic photodeposition of polymers
Author(s): Darren K. Jones; Carlos H. Mastrangelo; Mark A. Burns; David T. Burke
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Paper Abstract

The control and localization of small volumes of aqueous solutions inside miniature reactors is a topic of growing significance. A simple control method relies on patterning regions of different wetability that define and guide the liquid spread within these systems. In this paper photolithographic photodeposition is demonstrated as a technique for texturing patterned surfaces. Hydrophobic surfaces are created by selectively photopolymerizing trifluorochloroethylene gas (C2F3Cl) through a quartz mask. Similarly, hydrophilic surfaces are created via acetylene (C2H2) photopolymerization. These surfaces are demonstrated to provide a simple and effective means of fluidic control and localization.

Paper Details

Date Published: 10 September 1998
PDF: 8 pages
Proc. SPIE 3515, Microfluidic Devices and Systems, (10 September 1998); doi: 10.1117/12.322075
Show Author Affiliations
Darren K. Jones, Univ. of Michigan (United States)
Carlos H. Mastrangelo, Univ. of Michigan (United States)
Mark A. Burns, Univ. of Michigan (United States)
David T. Burke, Univ. of Michigan (United States)


Published in SPIE Proceedings Vol. 3515:
Microfluidic Devices and Systems
A. Bruno Frazier; Chong Hyuk Ahn, Editor(s)

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