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Proceedings Paper

Misalignment modes in off-axis lithography projection cameras
Author(s): Michael R. Descour; Curtis Earl Volin; Mark R. Willer
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Paper Abstract

We discuss the calculation and effect of rigid-body- perturbation misalignment modes in two off-axis extreme- ultraviolet lithography projection cameras: a 4-mirror, 0.14-numerical-aperture (NA) design and a 6-mirror, NA equals 0.2 design. Two sets of modes are considered: (1) modes associated with camera distortion within the design ring field of view and (2) modes associated with camera exit- pupil wavefront 632.8-nm-light metrology data. We show that in the case of the 4-mirror design, a significant distortion misalignment mode coincides with a difficult-to-detect metrology misalignment mode.

Paper Details

Date Published: 21 September 1998
PDF: 12 pages
Proc. SPIE 3482, International Optical Design Conference 1998, (21 September 1998); doi: 10.1117/12.322071
Show Author Affiliations
Michael R. Descour, Optical Sciences Ctr./Univ. of Arizona (United States)
Curtis Earl Volin, Optical Sciences Ctr./Univ. of Arizona (United States)
Mark R. Willer, Optical Sciences Ctr./Univ. of Arizona (United States)


Published in SPIE Proceedings Vol. 3482:
International Optical Design Conference 1998
Leo R. Gardner; Kevin P. Thompson, Editor(s)

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