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Proceedings Paper

Microlithographic lenses
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Paper Abstract

High resolution microlithographic reduction lenses are described. Design examples of projection lenses for i-line exposure lithography and for excimer laser exposure system are presented. The performance evaluation of these designs are also shown.

Paper Details

Date Published: 21 September 1998
PDF: 9 pages
Proc. SPIE 3482, International Optical Design Conference 1998, (21 September 1998); doi: 10.1117/12.322070
Show Author Affiliations
Romeo I. Mercado, Nikon Research Corp. of America (United States)
Tomoyuki Matsuyama, Nikon Research Corp. of America (Japan)


Published in SPIE Proceedings Vol. 3482:
International Optical Design Conference 1998
Leo R. Gardner; Kevin P. Thompson, Editor(s)

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