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Proceedings Paper

Surface modification by plasma immersion ion processing
Author(s): Kevin C. Walter; Deok Hyung Lee; X. M. He; N. P. Baker; Michael Nastasi; C. P. Munson; W. K. Scarborough; M. Tuszewski; B. P. Wood
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Paper Abstract

Los Alamos National Laboratory is actively researching a surface modification technique called plasma immersion ion processing (PIIP). PIIP is the latest innovation of the plasma source ion implantation (PSII) approach to surface modification. Like PSII, PIIP allows the modification of large areas and non-planar surface geometries, however PIIP is primarily a coating deposition technology rather than solely an ion implantation technology. PIIP utilizes a pulsed-bias on a target to extract ions out of plasma for ion implantation and coating deposition. Plasmas can be made by capacitive or inductive radio frequency sources or by initiating a glow discharge during each pulse of high voltage. Plasmas of hydrocarbon gases have been used to deposit adherent diamond-like carbon (DLC) coating son a variety of ferrous and non-ferrous materials. Instead of sputter depositing interlayers to improve the adhesion of DLC, PIIP uses ion implantation to create a graded interface between the metallic substrate and the DLC coating. Demonstrating the scaleability of PIIP, a 3 m2 area has been simultaneously coated with an adherent DLC coating approximately 7 micrometers thick. Plasmas of diborane and acetylene mixtures are being used to develop deposition processes for boron-carbide coatings. Through the use of organometallics and inorganic gases, other coatings are possible. The PIIP deposition conditions, composition and tribological properties of DLC and boron-carbide coatings will be highlighted.

Paper Details

Date Published: 17 September 1998
PDF: 9 pages
Proc. SPIE 3413, Materials Modification by Ion Irradiation, (17 September 1998); doi: 10.1117/12.321944
Show Author Affiliations
Kevin C. Walter, Los Alamos National Lab. (United States)
Deok Hyung Lee, Los Alamos National Lab. (United States)
X. M. He, Los Alamos National Lab. (United States)
N. P. Baker, Los Alamos National Lab. (United States)
Michael Nastasi, Los Alamos National Lab. (United States)
C. P. Munson, Los Alamos National Lab. (United States)
W. K. Scarborough, Los Alamos National Lab. (United States)
M. Tuszewski, Los Alamos National Lab. (United States)
B. P. Wood, Los Alamos National Lab. (United States)


Published in SPIE Proceedings Vol. 3413:
Materials Modification by Ion Irradiation
Emile J. Knystautas, Editor(s)

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