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Proceedings Paper

Pulsed laser deposition of metal oxide films
Author(s): Quanxi Jia
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Paper Abstract

Pulsed laser deposition (PLD), which provides very unique features compared to the conventional physical vapor deposition technique such as sputtering, is one of the most powerful techniques to deposit conductive oxide thin films. Over the past several years, we have optimized the processing conditions to deposit high quality conductive RuO2 and SrRuO3 thin films by PLD. We show that the substrate temperature during the deposition process plays an important role in determining the structural and electrical properties of these films. Epitaxial RuO2 and SrRuO3 thin films with a room-temperature resistivity of 35 (mu) (Omega) -cm and 280 (mu) (omega) -cm, respectively, have been successfully deposited by PLD.

Paper Details

Date Published: 14 September 1998
PDF: 5 pages
Proc. SPIE 3343, High-Power Laser Ablation, (14 September 1998); doi: 10.1117/12.321615
Show Author Affiliations
Quanxi Jia, Los Alamos National Lab. (United States)


Published in SPIE Proceedings Vol. 3343:
High-Power Laser Ablation
Claude R. Phipps, Editor(s)

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