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Proceedings Paper

Mask-adapted beam shaping for materials processing with excimer laser radiation
Author(s): Joerg Bernges; Lars Unnebrink; Thomas F. E. Henning; Ernst Wolfgang Kreutiz; Reinhart Poprawe
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Paper Abstract

Recent developments of non-rotationally symmetric optical elements (NOEs) for beam shaping in the field of material processing with excimer laser radiation are presented. The performance of a conventional faceted integrator and two faceted NOEs, designed to illuminate an annular aperture mask, are compared. Surface designs of the NOEs and results of material processing (ablation of polyimid foil by KrF excimer laser radiation) are presented. By mask adapted beam shaping NOEs improve the total transmission of the optical system.

Paper Details

Date Published: 19 August 1998
PDF: 4 pages
Proc. SPIE 3573, OPTIKA '98: 5th Congress on Modern Optics, (19 August 1998); doi: 10.1117/12.320987
Show Author Affiliations
Joerg Bernges, RWTH Aachen (Germany)
Lars Unnebrink, RWTH Aachen (Germany)
Thomas F. E. Henning, Fraunhofer-Institut fuer Lasertechnik (Germany)
Ernst Wolfgang Kreutiz, RWTH Aachen (Germany)
Reinhart Poprawe, RWTH Aachen (Germany)


Published in SPIE Proceedings Vol. 3573:
OPTIKA '98: 5th Congress on Modern Optics

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