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Proceedings Paper

Electroless Cu plating of alumina treated with cw CO2 laser radiation
Author(s): Beate Stolz; S. Geisler; George A. Shafeev; A. V. Simakin; Ernst-Wolfgang Kreutz; Reinhart Poprawe
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Paper Abstract

For the production of conductive structures in insulating ceramics UV excimer laser radiation is often used in two- step processes first to activate alumina, while the metal deposition is carried out subsequently from special solutions for electroless metal plating. An alternative process for obtaining conductive traces in alumina surface has been reported recently. However, the resulting conductivity is still far from the values required by fast progresses in packaging technology. In this paper the modification process is investigated with respect to the ability of the selectively laser-modified, alumina to promote electroless metal deposition. This is of basic interest because sources of CO2 radiation are more stable and easier to handle in comparison to sources of excimer radiation. Moreover the described process can be considered as an alternative way of alumina activation. It is shown that alumina treated with cw CO2 laser radiation under an ethanol layer takes on the ability to reduce Cu from its electroless plating bath which permits to significantly increase the conductivity of the laser- modified conductive tracers.

Paper Details

Date Published: 20 July 1998
PDF: 8 pages
Proc. SPIE 3328, Smart Structures and Materials 1998: Smart Electronics and MEMS, (20 July 1998); doi: 10.1117/12.320194
Show Author Affiliations
Beate Stolz, Fraunhofer-Institut fuer Lasertechnik (Germany)
S. Geisler, Lehrstuhl fuer Lasertechnik (Germany)
George A. Shafeev, General Physics Institute (Russia)
A. V. Simakin, General Physics Institute (Russia)
Ernst-Wolfgang Kreutz, Lehrstuhl fuer Lasertechnik (Germany)
Reinhart Poprawe, Fraunhofer-Institut fuer Lasertechnik (Germany) and Lehrstuhl fuer Lasertechnik (Germany)


Published in SPIE Proceedings Vol. 3328:
Smart Structures and Materials 1998: Smart Electronics and MEMS
Vijay K. Varadan; Paul J. McWhorter; Richard A. Singer; Michael J. Vellekoop, Editor(s)

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