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Proceedings Paper

Black photopolymer and fabrication of black matrix
Author(s): Jinmei Fu; Yong Li; Jinliang Guo; Hongjin Gao
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Paper Abstract

A water-soluble black photopolymer, containing PVA-SbQ, carbon black, surfactants and solvent, was developed for production of blackmatrix. Blackmatrix made from the black photopolymer has high opacity and good resolution. The negative charged carbon black is more suitable to be used as the light shielding substance. Several methods to shorten the exposure time were studied and discussed. Increasing the content of photosensitive group and exposed by lamp of high irradiation intensity are effective methods to shorten the exposure time. The fabrication of BM using this black photopolymer has some advantages over conventional methods: low cost, low light reflectivity and low pollution.

Paper Details

Date Published: 18 August 1998
PDF: 6 pages
Proc. SPIE 3560, Display Devices and Systems II, (18 August 1998); doi: 10.1117/12.319666
Show Author Affiliations
Jinmei Fu, Tsinghua Univ. (United States)
Yong Li, Tsinghua Univ. (China)
Jinliang Guo, Tsinghua Univ. (China)
Hongjin Gao, Tsinghua Univ. (China)


Published in SPIE Proceedings Vol. 3560:
Display Devices and Systems II
Shou-Qian Ding; Bao Gang Wu, Editor(s)

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