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Proceedings Paper

New method of measuring photoelastic properties of optical materials by using laser heterodyne interferometry
Author(s): Ge Kou; ChunKan Tao; Wanrong Gao; Luguo Hao; Xuan Min Yang; Ting Li
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Paper Abstract

Laser heterodyne interferometry is a kind of photoelectric phase measuring technique, it measures the optical path difference between the reference wavefront and the measured wavefront directly and needs not to deal with the interference figure. This technique can give very high phase measuring precision and can be used in dynamic optical phenomenon. This paper studies the basic principles of laser heterodyne interferometer, and the heterodyne interferometry has successfully been applied to the field of photoelastic properties of selected optical materials. A new method of measuring some parameters of photoelastic is presented. A device which brings atmosphere to bear on the optical materials has been developed to measure the change of refractive index at different pressures, and the relationship between the given pressure and the corresponding change of refractive index has been obtained through a series of experiments. Also, a careful analysis is given to the result of the experiments. At last, a feasible scheme is discussed on applying laser heterodyne interferometry to the measurement of refractive change.

Paper Details

Date Published: 10 August 1998
PDF: 8 pages
Proc. SPIE 3558, Automated Optical Inspection for Industry: Theory, Technology, and Applications II, (10 August 1998); doi: 10.1117/12.318440
Show Author Affiliations
Ge Kou, Nanjing Univ. of Science and Technology (China)
ChunKan Tao, Nanjing Univ. of Science and Technology (China)
Wanrong Gao, Nanjing Univ. of Science and Technology (China)
Luguo Hao, Nanjing Univ. of Science and Technology (China)
Xuan Min Yang, Nanjing Univ. of Science and Technology (China)
Ting Li, Nanjing Astronomical Instrument Research and Manufacture Ctr. (China)


Published in SPIE Proceedings Vol. 3558:
Automated Optical Inspection for Industry: Theory, Technology, and Applications II
Shenghua Ye, Editor(s)

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