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Proceedings Paper

Influence of deposition parameters on adhesion of diamondlike carbon film prepared by pulse-arc plasma deposition
Author(s): Zhinong Yu; Yixing Yan
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Paper Abstract

Diamond-like carbon films are prepared on silicon by pulse- arc plasma deposition. By means of orthogonal test method and scratch test technique, the relationships between adhesion of the deposited films and deposition parameters have been systematically analyzed. The results show that the substrate temperature, the voltage U across the interelectrode and the frequency of pulse greatly effect adhesion of the deposited films. The adhesion is strengthened with increasing substrate temperature and decreasing voltage across the interelectrode. A threshold frequency exists in dependence of adhesion of the deposited films on the frequency. The scratch test also indicates that intensive internal stress plays an important role in the adhesion of diamond-like carbon film.

Paper Details

Date Published: 5 August 1998
PDF: 4 pages
Proc. SPIE 3557, Current Developments in Optical Elements and Manufacturing, (5 August 1998); doi: 10.1117/12.318281
Show Author Affiliations
Zhinong Yu, Xi'an Jiaotong Univ. (China)
Yixing Yan, Xi'an Jiaotong Univ. (China)

Published in SPIE Proceedings Vol. 3557:
Current Developments in Optical Elements and Manufacturing
Qiming Xin; Robert E. Parks, Editor(s)

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