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Proceedings Paper

Fabrication of sol-gel optical element with dichromated gelatin as photoresist
Author(s): Lin Pang; Hui Wei; Yongqun Zeng; Bo Chen; Lurong Guo
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Paper Abstract

Based on the cleaving-etch method and hardening of dichromated gelatin (DCG), DCG was used as a photoresist for fabricating sol-gel optical elements. Anti-etch characteristic of hardened gelatin was investigated. Compared with etching of sol-gel, hardened gelatin could be used as photoresist to fabricate sol-gel optical elements. Coating condition of sol-gel was investigated. The results showed that thickness of coatings was independent of aging time of the sol-gel solution during a month. Thick multilayer sol-gel coatings were etched with HF solution after ammonia treatment. Good linearity was obtained, which showed adaptation of sol-gel coatings to fabricate optical elements. Using DCG resist the cleaving etch with method, the image of mask was transferred into sol-gel coatings. It was tested imitatively to smooth laser beams and the result was satisfactory.

Paper Details

Date Published: 5 August 1998
PDF: 6 pages
Proc. SPIE 3557, Current Developments in Optical Elements and Manufacturing, (5 August 1998); doi: 10.1117/12.318279
Show Author Affiliations
Lin Pang, Sichuan Univ. (China)
Hui Wei, Sichuan Univ. (China)
Yongqun Zeng, Sichuan Univ. (China)
Bo Chen, Sichuan Univ. (China)
Lurong Guo, Sichuan Univ. (China)

Published in SPIE Proceedings Vol. 3557:
Current Developments in Optical Elements and Manufacturing
Qiming Xin; Robert E. Parks, Editor(s)

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