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Proceedings Paper

Bandpass filter by a stretch and double-exposure technique
Author(s): Kaiming Zhou; Guiren An; Huang Ge; Wei Wang; Lin Zhang; Ian Bennion
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Paper Abstract

We fabricated a bandpass filter based on Moire Bragg grating in fiber with a uniform phase mask. We employed a stretch and two-exposure technique, in which the fiber was exposed to UV light from a KrF excimer through a phase mask and then the fiber is stretched and given another exposure at the same region. Due to the stretch, the periods of these two grating are slightly different, and there is a transmission between two reflection peaks at the Bragg wavelength of these two gratings. Applying different stretch can control the bandpass width of the filter. We measured the stretch characterization of a uniform Bragg grating and found the Bragg wavelength of the grating shifts linearly with the stretched length. We theoretically analyzed the grating structure and its reflection spectrum. The filter’s characteristics can be optimized by choosing appropriate parameters. We will give a theoretical discussion concerning which parameters and how they affect the filter's operation.

Paper Details

Date Published: 6 August 1998
PDF: 6 pages
Proc. SPIE 3552, Fiber Optic Components and Optical Communication II, (6 August 1998); doi: 10.1117/12.318054
Show Author Affiliations
Kaiming Zhou, Institute of Semiconductors (China)
Guiren An, Institute of Semiconductors (China)
Huang Ge, Institute of Semiconductors (China)
Wei Wang, Institute of Semiconductors (China)
Lin Zhang, Aston Univ. (United Kingdom)
Ian Bennion, Aston Univ. (United Kingdom)

Published in SPIE Proceedings Vol. 3552:
Fiber Optic Components and Optical Communication II
Shuisheng Jian; Franklin F. Tong; Reinhard Maerz, Editor(s)

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