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Proceedings Paper

Silicon field emitter microtip array fabricated by ion-beam etching
Author(s): Xinyu Zhang; Xinjian Yi; Miao He; Xing-Rong Zhao
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Paper Abstract

A relatively simple and effective method to fabricate 128- X 128-element emission microtips array on the surface of silicon substrate is proposed. The method mainly involves photolithographic process and argon ion beam etching. Typical center-to-center spacing of microtips fabricated is 50 micrometer, typical height is about 11 micrometer, and typical sharpness is about 9 sr. The scanning electron microscope analysis and the surface style measurement are presented for the surface morphology of two kinds of silicon emitters microtips (square-based pyramidal microtips and circle-based cone microtips) and circle microtips array. The experiments show that the technique used can be applied to fabricate silicon emitter microtips array and circle microtips array of larger area.

Paper Details

Date Published: 12 August 1998
PDF: 6 pages
Proc. SPIE 3551, Integrated Optoelectronics II, (12 August 1998); doi: 10.1117/12.317990
Show Author Affiliations
Xinyu Zhang, Huazhong Univ. of Science and Technology (China)
Xinjian Yi, Huazhong Univ. of Science and Technology (China)
Miao He, Huazhong Univ. of Science and Technology (China)
Xing-Rong Zhao, Huazhong Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 3551:
Integrated Optoelectronics II
BingKun Zhou; Ray T. Chen, Editor(s)

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