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Proceedings Paper

Novel method for fabricating waveguide grating by phase mask technique
Author(s): Shaojie Ma; Yan Li; Mai Xu; Yushan Yi; Jiuling Lin
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Paper Abstract

We report the fabrication of waveguides gratings coupler in photoresist by using a volume holographic gratings and that of the holographic gratings by Red Sensitive Photopolymer at 632.8 nm. The holographic gratings can produce diffracted light of 0 and -1 orders with equal intensity. The two diffracted light beams yield the interference fringe of period in near field, which is as laser sources to expose the photoresist on waveguide.

Paper Details

Date Published: 12 August 1998
PDF: 3 pages
Proc. SPIE 3551, Integrated Optoelectronics II, (12 August 1998); doi: 10.1117/12.317967
Show Author Affiliations
Shaojie Ma, Changchun Institute of Physics (China)
Yan Li, Changchun Institute of Physics (China)
Mai Xu, Changchun Institute of Physics (China)
Yushan Yi, Changchun Institute of Physics (China)
Jiuling Lin, Changchun Institute of Physics (China)


Published in SPIE Proceedings Vol. 3551:
Integrated Optoelectronics II
BingKun Zhou; Ray T. Chen, Editor(s)

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