Share Email Print

Proceedings Paper

Ripple formation in excimer laser-irradiated silicon dioxide/silicon system
Author(s): J. J. Yu; Yongfeng Lu
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Excimer laser-induced surface structures at the interfaces of Silicon dioxide/Silicon have been investigated experimentally. It is found that a stable, fine and homogeneous ripple structure is preferentially generated under a comparatively larger laser beam. The ripple periodicity seems to have no angular dependence and is enhanced with the increased laser pulses only before the irradiation of certain pulse numbers. The initial substrate temperature also represents an important parameter which can be used to control the interface ripple structures. The correlation between the threshold laser pulse for the ripple formation and laser fluence, the threshold laser pulse and the oxide thickness is studied as well. This study will be helpful in understanding the physics of laser- induced ripple formation by some key parameters, and hence be useful in controlling the ripple structures within the range required for the laser texturing for the high density magnetic recording media.

Paper Details

Date Published: 15 August 1998
PDF: 7 pages
Proc. SPIE 3550, Laser Processing of Materials and Industrial Applications II, (15 August 1998); doi: 10.1117/12.317950
Show Author Affiliations
J. J. Yu, National Univ. of Singapore (Singapore)
Yongfeng Lu, National Univ. of Singapore (United States)

Published in SPIE Proceedings Vol. 3550:
Laser Processing of Materials and Industrial Applications II
ShuShen Deng; S. C. Wang, Editor(s)

© SPIE. Terms of Use
Back to Top