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Proceedings Paper

Laser ablation of PMMA doped with benzyl
Author(s): Jun Wang; Hiroyuki Niino; Akira Yabe
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Paper Abstract

KrF-laser ablation of poly(methylmethacrylate) (PMMA) doped with benzil was studied from the viewpoint of nonlinear absorption of the PMMA film during the laser irradiation. After measuring the relationship between the transmission and incident laser intensity, we developed a novel method to obtain absorption coefficient depending on laser intensity. Using the nonlinear absorption coefficient of PMMA doped with benzil, we succeeded in fitting the relationship of etch depth and laser intensity. The dependence of concentration of benzil in PMMA film and the difference between benzil and pyrene were also discussed.

Paper Details

Date Published: 15 August 1998
PDF: 8 pages
Proc. SPIE 3550, Laser Processing of Materials and Industrial Applications II, (15 August 1998); doi: 10.1117/12.317934
Show Author Affiliations
Jun Wang, National Institute of Materials and Chemical Research (Japan)
Hiroyuki Niino, National Institute of Materials and Chemical Research (Japan)
Akira Yabe, National Institute of Materials and Chemical Research (Japan)


Published in SPIE Proceedings Vol. 3550:
Laser Processing of Materials and Industrial Applications II
ShuShen Deng; S. C. Wang, Editor(s)

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