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Proceedings Paper

Preparation of nanosized SiO2 powder through laser-induced chemical vapor deposition technology
Author(s): Zhi Chao Wang; Feng Wu; Yongpeng Zhao; Chongqing Wu; Shuisheng Jian
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Paper Abstract

In this article, the mechanism of the LICVD process preparing SiO2 powder is analyzed. We discuss a lot of parameters such as the laser power density, spot size, the mass flowing of reactant, the ration of all reactants, the torch size, etc. After series of experiments, we successfully gained the silica powder which diameter is about 100 nm by using vertical equipment.

Paper Details

Date Published: 15 August 1998
PDF: 4 pages
Proc. SPIE 3550, Laser Processing of Materials and Industrial Applications II, (15 August 1998); doi: 10.1117/12.317919
Show Author Affiliations
Zhi Chao Wang, Northern Jiaotong Univ. (China)
Feng Wu, Northern Jiaotong Univ. (China)
Yongpeng Zhao, Northern Jiaotong Univ. (China)
Chongqing Wu, Northern Jiaotong Univ. (China)
Shuisheng Jian, Northern Jiaotong Univ. (China)


Published in SPIE Proceedings Vol. 3550:
Laser Processing of Materials and Industrial Applications II
ShuShen Deng; S. C. Wang, Editor(s)

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