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Proceedings Paper

Manufacturing technology by synchrotron radiation in NSRL
Author(s): Xinyi Zhang; Dapeng Chen; Yiguan Hu; Yangchao Tian; Shaojun Fu; Ya Kan; Andong Xia; Yilin Hong; Xiaoming Tao; Gang Liu
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Paper Abstract

In this paper a brief description is given to introduce the activities of the manufacturing technology using the synchrotron radiation light source in the National Synchrotron Radiation Laboratory (NSRL). The light source in NSRL is a dedicated synchrotron radiation facility in China. Five beamlines and corresponding experimental stations, including soft x-ray lithography, have been constructed. The main experimental results obtained from the soft x-ray lithography station are reported. We have fabricated some devices using the synchrotron radiation lithography, for example, the high electron mobility transistor, high Tc superconductor infrared detector-array, diffraction grating, and micro condenser zone plate. A simple method for the achievement of synchrotron radiation x-ray lithography mask will also be presented. The LIGA (German abbreviation for: Lithograpie, Galvanoforming, and Abforming) technique has been developed in NSRL. It is the most promising technique for the fabrication of three-dimensional microstructures. We are successful in making several microdevices by deep x-ray lithography and microelectroforming, such as microgearwheel, micro acceleration sensor.

Paper Details

Date Published: 15 August 1998
PDF: 5 pages
Proc. SPIE 3550, Laser Processing of Materials and Industrial Applications II, (15 August 1998); doi: 10.1117/12.317908
Show Author Affiliations
Xinyi Zhang, Univ. of Science and Technology of China (China)
Dapeng Chen, Univ. of Science and Technology of China (China)
Yiguan Hu, Univ. of Science and Technology of China (China)
Yangchao Tian, Univ. of Science and Technology of China (China)
Shaojun Fu, Univ. of Science and Technology of China (China)
Ya Kan, Univ. of Science and Technology of China (China)
Andong Xia, Univ. of Science and Technology of China (China)
Yilin Hong, Univ. of Science and Technology of China (China)
Xiaoming Tao, Univ. of Science and Technology of China (China)
Gang Liu, Univ. of Science and Technology of China (China)


Published in SPIE Proceedings Vol. 3550:
Laser Processing of Materials and Industrial Applications II
ShuShen Deng; S. C. Wang, Editor(s)

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