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Proceedings Paper

Single-pulse high-resolution x-ray contact microscopy with an advanced epoxy novolac resist
Author(s): Panagiotis Argitis; Alkiviadis Constantinos Cefalas; Z. Kollia; Evangelia Sarantopoulou; Thomas W. Ford; Tony Stead; A. Marranca; Colin N. Danson; J. Knott; David Neely
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Paper Abstract

We report on the use of an epoxy novolac chemically amplified photoresist, to get x-ray images of living biological species in the water window of soft x-rays. This photoresist response was at least two orders of magnitude 'faster' than the standard used PMMA in contact x-ray microscopy. Atomic force microscopy of the resist, relief images obtained with biological specimen masking, suggests a resolution better than 300 nm in lateral dimensions - the size of the cell flagellas - and 20 nm in depth profiles.

Paper Details

Date Published: 14 July 1998
PDF: 5 pages
Proc. SPIE 3423, Second GR-I International Conference on New Laser Technologies and Applications, (14 July 1998); doi: 10.1117/12.316626
Show Author Affiliations
Panagiotis Argitis, National Hellenic Research Foundation (Greece)
Alkiviadis Constantinos Cefalas, National Hellenic Research Foundation (Greece)
Z. Kollia, National Hellenic Research Foundation (Greece)
Evangelia Sarantopoulou, National Hellenic Research Foundation (Greece)
Thomas W. Ford, Univ. of London (United Kingdom)
Tony Stead, Univ. of London (United Kingdom)
A. Marranca, Univ. of London (United Kingdom)
Colin N. Danson, Rutherford Appleton Lab. (United Kingdom)
J. Knott, Rutherford Appleton Lab. (United Kingdom)
David Neely, Rutherford Appleton Lab. (United Kingdom)


Published in SPIE Proceedings Vol. 3423:
Second GR-I International Conference on New Laser Technologies and Applications
Alexis Carabelas; Paolo Di Lazzaro; Amalia Torre; Giuseppe Baldacchini, Editor(s)

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