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Proceedings Paper

Electron beam lithography on LiF films for integrated active optical waveguides
Author(s): Giuseppe Baldacchini; E. Burattini; Antonio Grilli; A. Raco; Antonella Mancini; Rosa Maria Montereali; A. Pace
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Paper Abstract

Low energy electron beam irradiation of LiF single crystals and polycrystalline films induces efficient formation of stable laser active defects emitting in the visible spectral range at room temperature, together with a consistent increase of the real part of the refractive index in the same wavelength interval. The use of electron lithography techniques look promising for the realization of active channel waveguides.

Paper Details

Date Published: 14 July 1998
PDF: 5 pages
Proc. SPIE 3423, Second GR-I International Conference on New Laser Technologies and Applications, (14 July 1998); doi: 10.1117/12.316557
Show Author Affiliations
Giuseppe Baldacchini, ENEA Frascati (Italy)
E. Burattini, INFN-Lab. Nazionali de Frascati (Italy)
Antonio Grilli, INFN-Lab. Nazionali de Frascati (Italy)
A. Raco, INFN-Lab. Nazionali de Frascati (Italy)
Antonella Mancini, ENEA Frascati (Italy)
Rosa Maria Montereali, ENEA Frascati (Italy)
A. Pace, ENEA Frascati (Italy)

Published in SPIE Proceedings Vol. 3423:
Second GR-I International Conference on New Laser Technologies and Applications
Alexis Carabelas; Paolo Di Lazzaro; Amalia Torre; Giuseppe Baldacchini, Editor(s)

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