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Proceedings Paper

Cathode roughness effects in a high-PRF long-pulse XeCl laser
Author(s): I. Tassy; Philippe Ch. Delaporte; Bernard L. Fontaine; Bernard M. Forestier; Marc L. Sentis; Olivier P. Uteza
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Paper Abstract

The uniformity and stability of discharge process in a high pulse repetition frequency long pulse XeCl laser are investigated for three different copper electrode roughnesses in single shot regime and versus PRF. The discharge quality evolution is experimentally analyzed from discharge photographs obtained with CCD video camera and pressure perturbation measurements achieved with a piezoelectric pressure probe placed very close to the discharge volume.

Paper Details

Date Published: 14 July 1998
PDF: 5 pages
Proc. SPIE 3423, Second GR-I International Conference on New Laser Technologies and Applications, (14 July 1998); doi: 10.1117/12.316556
Show Author Affiliations
I. Tassy, Univ. Aix-Marseille I and II (France)
Philippe Ch. Delaporte, Univ. Aix-Marseille I and II (France)
Bernard L. Fontaine, Univ. Aix-Marseille I and II (France)
Bernard M. Forestier, Univ. Aix-Marseille I and II (France)
Marc L. Sentis, Univ. Aix-Marseille I and II (France)
Olivier P. Uteza, Univ. Aix-Marseille I and II (France)


Published in SPIE Proceedings Vol. 3423:
Second GR-I International Conference on New Laser Technologies and Applications
Alexis Carabelas; Paolo Di Lazzaro; Amalia Torre; Giuseppe Baldacchini, Editor(s)

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