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Proceedings Paper

Flatness measurement by a UV moire technique
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Paper Abstract

A moire method using phase shifting technique is proposed for a flatness measurement, with highly accurate and fast measurement time, especially of computer discs, wafers or glass substrates. Two methods are proposed for the expansion of measurement size and for the elimination of the reflected light from the back plane of the glass substrate. One is to joint small measured areas one another the flatness of which are measured in advance and the other is UV moire technique. Using these techniques, the proposed system realizes higher accuracy than conventional techniques without any limitation of the size in the glass substrate measurement.

Paper Details

Date Published: 30 June 1998
PDF: 4 pages
Proc. SPIE 3478, Laser Interferometry IX: Techniques and Analysis, (30 June 1998); doi: 10.1117/12.312970
Show Author Affiliations
Hisatoshi Fujiwara, Yamatake-Honeywell Inc. (Japan)
Yutaka Kodera, Tokyo Univ. of Agriculture and Technology (Japan)
Yukitoshi Otani, Tokyo Univ. of Agriculture and Technology (Japan)
Toru Yoshizawa, Tokyo Univ. of Agriculture and Technology (Japan)


Published in SPIE Proceedings Vol. 3478:
Laser Interferometry IX: Techniques and Analysis
Malgorzata Kujawinska; Gordon M. Brown; Mitsuo Takeda, Editor(s)

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