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Proceedings Paper

Precise measurement of nonoptical surfaces by an oblique incidence interferometer
Author(s): Yukitoshi Otani; Toyoaki Kuwahara; Masayuki Yamamoto; Toru Yoshizawa
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Paper Abstract

Silicon wafers are widely used for semiconductors. Its flatness is very important in the inspection process. An oblique incidence interferometer with a one step phase- shifting technique using only one image was proposed for its inspection. This technique is developed for precise surface profile measurement even if the sample is mirror surface with multiple reflection between measurement and reference surface. To cover a large measurement area, the extension of the measurement area is archived to combine small area one after the another.

Paper Details

Date Published: 30 June 1998
PDF: 4 pages
Proc. SPIE 3478, Laser Interferometry IX: Techniques and Analysis, (30 June 1998); doi: 10.1117/12.312939
Show Author Affiliations
Yukitoshi Otani, Tokyo Univ. of Agriculture and Technology (Japan)
Toyoaki Kuwahara, Tokyo Univ. of Agriculture and Technology (Japan)
Masayuki Yamamoto, Tokyo Univ. of Agriculture and Technology (Japan)
Toru Yoshizawa, Tokyo Univ. of Agriculture and Technology (Japan)


Published in SPIE Proceedings Vol. 3478:
Laser Interferometry IX: Techniques and Analysis
Malgorzata Kujawinska; Gordon M. Brown; Mitsuo Takeda, Editor(s)

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